Silicon Carbide Lapping Slurry

Product Details
Customization: Available
Material: Diamond
Abrasive: Liquid
Manufacturer/Factory, Trading Company, Other
Gold Member Since 2019

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  • Silicon Carbide Lapping Slurry
  • Silicon Carbide Lapping Slurry
  • Silicon Carbide Lapping Slurry
  • Silicon Carbide Lapping Slurry
  • Silicon Carbide Lapping Slurry
  • Silicon Carbide Lapping Slurry
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Basic Info.

Shapes
Round
Types
Surface Grinding Wheel
Grain Size
None
Cylindricity
<1
Circular Degree
<0.05
Technics
Polishing
Working Style
Surface Precisisonm Lapping and Polishing
New Product
Replace Old Products
Application
Grinding and Polishing
Eexport
America, Korea
Payment
Payple, T/T, C/L
Grade
4-20 Micron
Disposit
30%
Transport Package
Carton
Specification
20L
Trademark
BOSDI
Origin
China
HS Code
6804219090
Production Capacity
500PCS/Day

Product Description

Silicon Carbide Lapping SlurrySilicon Carbide Lapping SlurrySilicon Carbide Lapping SlurrySilicon Carbide Lapping SlurrySilicon Carbide Lapping SlurryProduct Description
Bosdi's Silicon carbide polishing fluid is used for precision grinding and polishing of silicon carbide chips and other materials. This product is paired with a specialized silicon carbide polishing pad to improve efficiency and the surface quality of silicon carbide chips after precision grinding is high (roughness, scratches, subsurface damage layer,etc.). Silicone Carbide has a water soluble carrier formula which possesses a good cleaning performance.The product has good suspension stability an dwhen compared to conventional water-based formulas, the product has better lubrication performance.
Note: Customization can be made according to customer requirements


Silicon Carbide Lapping Slurry
 
Silicon Carbide Lapping Slurry
Characteristics of Product:1. Many kinds of abrasives are available such as polycrystalline diamond, monocrystalline diamond and nano diamond.
2. It has strict technical control which ennsures the consistency of the quality.
3. Suitable viscosity can meet all the different ways of of feeding such as dropwise and spraying.
4. Product has good suspension and dispersibility which make it easier to shake before use.
5.  Excxellent removal rate.
6. Good cleaning property.


 


Main applications:
It is mainly used for the precision lapping and polishing of sapphire wafers, semiconductor materials, compound crystal, hard alloy, stainl;ess steel, ceramic materials and gems. if collocating with suitable lapping plate and polishing pad, it can achieve ideal removal efficiency and good surface effect. The product is also uised for grinding and polishiong silicon carbide chips and other materials that were mentioned above. 
 
 
Product Type Particle Size Abrasive Type Properties
BSD-SIC D50=2-4 μm Poly/ Polycrystalline-like diamond Stable Suspension ,
Water-based carrier
D50=0-1μm Poly/ Polycrystalline-like diamond Stable Suspension ,
Water-based carrier
D50=2-4 μm Polycrystalline-like diamond Stable Suspension ,
Water-based carrier

 

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